JPH0521867Y2 - - Google Patents

Info

Publication number
JPH0521867Y2
JPH0521867Y2 JP11740687U JP11740687U JPH0521867Y2 JP H0521867 Y2 JPH0521867 Y2 JP H0521867Y2 JP 11740687 U JP11740687 U JP 11740687U JP 11740687 U JP11740687 U JP 11740687U JP H0521867 Y2 JPH0521867 Y2 JP H0521867Y2
Authority
JP
Japan
Prior art keywords
chamber
wafer
work coil
reaction chamber
susceptor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP11740687U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6422025U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11740687U priority Critical patent/JPH0521867Y2/ja
Publication of JPS6422025U publication Critical patent/JPS6422025U/ja
Application granted granted Critical
Publication of JPH0521867Y2 publication Critical patent/JPH0521867Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

JP11740687U 1987-07-29 1987-07-29 Expired - Lifetime JPH0521867Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11740687U JPH0521867Y2 (en]) 1987-07-29 1987-07-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11740687U JPH0521867Y2 (en]) 1987-07-29 1987-07-29

Publications (2)

Publication Number Publication Date
JPS6422025U JPS6422025U (en]) 1989-02-03
JPH0521867Y2 true JPH0521867Y2 (en]) 1993-06-04

Family

ID=31360840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11740687U Expired - Lifetime JPH0521867Y2 (en]) 1987-07-29 1987-07-29

Country Status (1)

Country Link
JP (1) JPH0521867Y2 (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3611780B2 (ja) * 1992-09-07 2005-01-19 三菱電機株式会社 半導体製造装置
JP4232279B2 (ja) * 1999-07-06 2009-03-04 ソニー株式会社 気相成長装置

Also Published As

Publication number Publication date
JPS6422025U (en]) 1989-02-03

Similar Documents

Publication Publication Date Title
KR0139793B1 (ko) 막형성 방법
US9589819B1 (en) Substrate processing apparatus
US20140326276A1 (en) Cobalt removal for chamber clean or pre-clean process
TWI462185B (zh) 基板處理裝置，基板支持具及半導體裝置之製造方法
KR20140036978A (ko) 처리 시스템
JPWO2007018139A1 (ja) 半導体装置の製造方法および基板処理装置
KR100605884B1 (ko) 표면 처리 방법 및 장치
JPH03136345A (ja) 半導体ウエーハ処理装置
JP3204836B2 (ja) プラズマ処理方法およびプラズマ処理装置
JP2000208498A (ja) 表面処理方法及びその装置
JP3667038B2 (ja) Ｃｖｄ成膜方法
JPH0521867Y2 (en])
JP2744933B2 (ja) 縦型処理装置及び処理装置
JP4703844B2 (ja) グラファイトナノファイバー薄膜形成用熱ｃｖｄ装置
JP3070567B2 (ja) 縦型減圧気相成長装置とこれを用いた気相成長方法
JPS6112035A (ja) 半導体製造装置
JP3173698B2 (ja) 熱処理方法及びその装置
JP4627863B2 (ja) グラファイトナノファイバー薄膜形成用熱ｃｖｄ装置
JPS63119525A (ja) プラズマｃｖｄ装置
JP4627860B2 (ja) グラファイトナノファイバー薄膜形成用熱ｃｖｄ装置
JPH1192280A (ja) シリコンエピタキシャル気相成長装置
JPH10223620A (ja) 半導体製造装置
JP4677087B2 (ja) グラファイトナノファイバー薄膜形成用熱ｃｖｄ装置
JPH01275784A (ja) エッチング装置
JP2004146508A (ja) 基板処理装置